Search programme

​Use the search function to search amongst programmes at Chalmers. The study programme and the study programme syllabus relating to your studies are generally from the academic year you began your studies.

Syllabus for

Academic year
FKA196 - Fundamentals of micro- and nanotechnology
 
Syllabus adopted 2011-02-22 by Head of Programme (or corresponding)
Owner: MPNAT
7,5 Credits
Grading: TH - Five, Four, Three, Not passed
Education cycle: Second-cycle
Major subject: Electrical Engineering, Engineering Physics
Department: 59 - MICROTECHNOLOGY AND NANOSCIENCE


Teaching language: English
Open for exchange students
Block schedule: B

Course module   Credit distribution   Examination dates
Sp1 Sp2 Sp3 Sp4 Summer course No Sp
0106 Examination 7,5 c Grading: TH   7,5 c   25 Oct 2013 pm V,  Contact examiner

In programs

MPAEM MATERIALS ENGINEERING, MSC PROGR, Year 2 (elective)
MPAPP APPLIED PHYSICS, MSC PROGR, Year 2 (elective)
MPEES EMBEDDED ELECTRONIC SYSTEM DESIGN, MSC PROGR, Year 2 (elective)
MPNAT NANOTECHNOLOGY, MSC PROGR, Year 1 (compulsory)
MPWPS WIRELESS, PHOTONICS AND SPACE ENGINEERING, MSC PROGR, Year 2 (elective)

Examiner:

Bitr professor  Avgust Yurgens
Univ lektor  Ulf Södervall


Course evaluation:

http://document.chalmers.se/doc/4974bd6f-3ff9-4b92-a6a6-29d14ae168c7


Eligibility:

For single subject courses within Chalmers programmes the same eligibility requirements apply, as to the programme(s) that the course is part of.

Course specific prerequisites

University-level of General Physics and Mathematics.

Aim

Microelectronics has had tremendous development during the last ten years broadening the field of applications in many directions. The industry is constantly pushing the critical device dimensions down to the nanometer scale. This is not possible without development of the material science and nano-processing technology. A great many sophisticated instruments and techniques built up to make and characterize micro- and nano-scale devices have already become indispensable in virtually every research area and high-tech industry. There are numerous and growing novel applications in telecommunication, safety, photonics, optoelectronics, energy harvesting, micro-fluidics, sensors, information storage, etc. that demand reliable nano-processing techniques and tools. Further progress requires a continuous search for new materials (e.g. graphene), new physical principles of operation (e.g. spintronics) and advanced methods of fabrication, processing and characterization of nano-devices (e.g. focused-ion milling, x-ray- and near-field lithography).

The course aims at giving a basic knowledge of modern micro- and nano-scale processing (pattern transfer by different lithography techniques; the plasma-, thermal-, and chemical processes for etching and modification of materials; thin film deposition methods), as well as characterization techniques for assessing the resulting materials- and device properties. Also, a few examples of basic processing steps for fabrication of CMOS-transistors, light-emitting diodes, lasers, micro-electromechanical systems and microfluidic devices will be described. Laboratory exercises in the clean room of the Microtechnology Centre at Chalmers (MC2) will demonstrate how the nano-scale fabrication equipment functions in reality.

Learning outcomes (after completion of the course the student should be able to)

* describe and arrange material-science aspects and physical principles of
nano-scale technology;
* examine and illustrate the link between processing, material structure,
resulting properties, and performance of the devices;
* select proper materials, deposition, and characterization techniques for a
given task;
* describe and assess advantages and limitations of different lithography- and
thin-film deposition techniques;
* overview the development- and describe the most recent trends in nano-scale
technology;
* present a critical summary of one of the novel and promising nano- fabrication techniques or devices at a student conference;
* tell the general rules and safety procedures for working in the clean-room
environment and with hazardous chemicals.

The course provides a basis for further studies at the undergraduate and
postgraduate level, diploma work, and professional preparation in the field of
nanotechnology.

Content

The core of the course is dedicated to the theory and practice of micro- and nano-fabrication techniques, one of the most important constituents of modern Nanoscale Technology. Modern pattern transfer techniques like e-beam- or x-ray lithography and various thin film deposition methods including thermal-evaporation, sputtering, chemical-vapor deposition, and epitaxy are covered in this course, with their physical- and chemical backgrounds shortly mentioned. Film formation, its structure and methods of characterization are explained, with particular emphasis on correlation between the deposition parameters and resulting material properties. During the lectures students also learn the vacuum systems including system operation and design, and the physical processes in gases. Also, a few practical devices like CMOS-transistors or light-emitting diodes are considered in more details.

Organisation

This course includes lectures, several demonstrations, and a literature project. A number of simple home assignments (quizzes) will be given to deepen the knowledge obtained during the lectures.

Literature

"Introduction to Microelectronic Fabrication" by R.C. Jaeger (Pearson Edu. Ltd., London; ISBN 0-201-44494-7). Also, "The Materials Science of Thin Films" by M. Ohring (ISBN: 012524990x; 1992) is available as an e-book free of charge through Chalmers library. Second edition (ISBN 0125249756) can be used as well (www.amazon.com). Moreover, lecture notes will be delivered electronically before the corresponding lectures.

Examination

Quiz-based written examination.

Up to 25% of the total score will be given for making a literature project (10%), for doing home assignments (quizzes) and participation in lab demonstrations (15%).


Page manager Published: Mon 28 Nov 2016.