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Graduate courses

Departments' graduate courses for PhD-students.


Syllabus for

Academic year
FKA196 - Fundamentals of micro- and nanotechnology  
Grunderna i mikro- och nanoteknologi
Syllabus adopted 2019-02-19 by Head of Programme (or corresponding)
Owner: MPNAT
7,5 Credits
Grading: TH - Five, Four, Three, Fail
Education cycle: Second-cycle
Major subject: Electrical Engineering, Engineering Physics

Teaching language: English
Application code: 18126
Open for exchange students: Yes
Block schedule: B
Maximum participants: 90

Module   Credit distribution   Examination dates
Sp1 Sp2 Sp3 Sp4 Summer course No Sp
0106 Examination 7,5c Grading: TH   7,5c   28 Oct 2019 am M   07 Jan 2020 pm M   Contact examiner

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In order to be eligible for a second cycle course the applicant needs to fulfil the general and specific entry requirements of the programme that owns the course. (If the second cycle course is owned by a first cycle programme, second cycle entry requirements apply.)
Exemption from the eligibility requirement: Applicants enrolled in a programme at Chalmers where the course is included in the study programme are exempted from fulfilling these requirements.

Course specific prerequisites

University-level of General Physics and Mathematics.


Microelectronics has had tremendous development during the last ten years broadening the field of applications in many directions. The industry is constantly pushing the critical device dimensions down to the nanometer scale. This is not possible without development of the material science and nano-processing technology. A great many sophisticated instruments and techniques built up to make and characterize micro- and nano-scale devices have already become indispensable in virtually every research area and high-tech industry. There are numerous and growing novel applications in telecommunication, safety, photonics, optoelectronics, energy harvesting, micro-fluidics, sensors, information storage, etc. that demand reliable nano-processing techniques and tools. Further progress requires a continuous search for new materials (e.g. graphene), new physical principles of operation (e.g. spintronics) and advanced methods of fabrication, processing and characterization of nano-devices (e.g. focused-ion milling, x-ray- and near-field lithography).

The course aims at giving a basic knowledge of modern micro- and nano-scale processing (pattern transfer by different lithography techniques; the plasma-, thermal-, and chemical processes for etching and modification of materials; thin film deposition methods), as well as characterization techniques for assessing the resulting materials- and device properties. Also, a few examples of basic processing steps for fabrication of CMOS-transistors, light-emitting diodes, lasers, micro-electromechanical systems and microfluidic devices will be described. Laboratory exercises in the clean room of the Microtechnology Centre at Chalmers (MC2) will demonstrate how the nano-scale fabrication equipment functions in reality.

Learning outcomes (after completion of the course the student should be able to)

  • describe and arrange material-science aspects and physical principles of nano-scale technology
  • examine and illustrate the link between processing, material structure, resulting properties, and performance of the devices
  • select proper materials, deposition, and characterization techniques for a given task
  • describe and assess advantages and limitations of different lithography- and thin-film deposition techniques
  • overview the development- and describe the most recent trends in nano-scale technology
  • present a critical summary of one of the novel and promising nano- fabrication techniques or devices at a student conference
  • tell the general rules and safety procedures for working in the clean-room environment and with hazardous chemicals.

The course provides a basis for further studies at the undergraduate and postgraduate level, diploma work, and professional preparation in the field of nanotechnology.


The core of the course is dedicated to the theory and practice of micro- and nano-fabrication techniques, one of the most important constituents of modern Nanoscale Technology. Modern pattern transfer techniques like e-beam- or x-ray lithography and various thin film deposition methods including thermal-evaporation, sputtering, chemical-vapor deposition, and epitaxy are covered in this course, with their physical- and chemical backgrounds shortly mentioned. Film formation, its structure and methods of characterization are explained, with particular emphasis on correlation between the deposition parameters and resulting material properties. During the lectures students also learn the vacuum systems including system operation and design, and the physical processes in gases. Also, a few practical devices like CMOS-transistors or light-emitting diodes are considered in more details.


This course includes lectures, several demonstrations, and a literature project. A number of quizzes are given to deepen the knowledge obtained during the lectures and to prepare for the quiz-based exam.


"Introduction to Microfabrication" by Sami Fransilla (ISBN 978-0-470-74983-8, Wiley). This is available as E-book at Chalmers Library. Lecture  PPT will be available in Ping Pong close to lecture date..

2 other books that can be used as reference material;  "Introduction to Microelectronic Fabrication" by R.C. Jaeger (Pearson Edu Ltd, London, ISBN 0-201-44494-7) and "The Materials Science of Thin Films" by M. Ohring (ISBN: 012524990x, 1992 (ISBN 0125249756) .

"Introduction to Microelectronic Fabrication" by R.C. Jaeger (Pearson Edu. Ltd., London; ISBN 0-201-44494-7). Also, "The Materials Science of Thin Films" by M. Ohring (ISBN: 012524990x; 1992) is available as an e-book free of charge through Chalmers library. Second edition (ISBN 0125249756) can be used as well. Moreover, lecture notes will be delivered electronically before the corresponding lectures.

Examination including compulsory elements

Quiz-based written examination usually containing 120-130 quiz questions (70%). 20% will be given for doing homework assignments. The last 10% will be given for making a literature project and participation in the lab demonstrations.

Published: Wed 26 Feb 2020.