|TIF030 - Modern imaging, spectroscopy and diffraction techniques
| Syllabus adopted 2014-02-25 by Head of Programme (or corresponding)
|Grading: TH - Five, Four, Three, Not passed
|Education cycle: Second-cycle
Major subject: Engineering Physics
Department: 16 - PHYSICS
Teaching language: English
Open for exchange students
30 Oct 2014 pm M,
05 Jan 2015 am M,
28 Aug 2015 am M
MPAEM MATERIALS ENGINEERING, MSC PROGR, Year 2 (elective)
MPAPP APPLIED PHYSICS, MSC PROGR, Year 1 (compulsory elective)
MPBME BIOMEDICAL ENGINEERING, MSC PROGR, Year 2 (elective)
MPNAT NANOTECHNOLOGY, MSC PROGR, Year 1 (compulsory elective)
MPNAT NANOTECHNOLOGY, MSC PROGR, Year 2 (elective)
MPPAS PHYSICS AND ASTRONOMY, MSC PROGR, Year 2 (elective)
MPWPS WIRELESS, PHOTONICS AND SPACE ENGINEERING, MSC PROGR, Year 2 (elective)
Professor Eva Olsson
Professor Mikael Käll
Course evaluation: http://document.chalmers.se/doc/c5705589-e692-4d61-96b8-b0e1409230da
In order to be eligible for a second cycle course the applicant needs to fulfil the general and specific entry requirements of the programme that owns the course. (If the second cycle course is owned by a first cycle programme, second cycle entry requirements apply.)
Exemption from the eligibility requirement:
Applicants enrolled in a programme at Chalmers where the course is included in the study programme are exempted from fulfilling these requirements.
Course specific prerequisites
Basic courses in physics, including optics and condensed materials, are recommended.
Advanced imaging, spectroscopy and diffraction techniques are used in industry as well as academia. Many methods are based on radiation (for example, visible light, X-rays or electrons) while others are based on other effects e.g. electric fields or atomic forces. They provide crucial information about the correlation between structure, dynamics and properties of hard and soft materials ranging from high performance steels to living cells.
The aim of this course is to provide basic understanding and practical experience from using some of the most important optical, electron and scanning probe microscopies. The course provides an insight into these methods that is essential for careers in both science and R&D-industry. It is a base for more advanced and specialized courses in, for example, experimental physics, nanoscience and material science.
Learning outcomes (after completion of the course the student should be able to)
After the course the student should:
Be able to describe and discuss important applications of optical, scanning probe and electron microscopy.
Be able to describe and discuss the basic concepts of image formation in optical, scanning probe and electron microscopy, including the limits of spatial resolution in an imaging system.
Be able to understand and describe the basic concepts of diffraction and reciprocal space, and how this is related to image formation.
Be able to describe and discuss important image aberrations and artifacts in optical, scanning probe and electron microscopy.
Be able to describe and discuss important spectroscopy methods and corresponding sources of contrast in optical and electron microscopy.
Be able to propose suitable imaging analysis techniques for solving particular problems in experimental physics, nanoscience, biophysics, material science and other fields of interest.
Be able to understand advanced literature on optical, scanning probe and electron microscopy.
Have acquired basic practical experience of optical microscopy, including fluorescence microscopy.
Have acquired basic practical experience of atomic force microscopy.
Have acquired basic practical experience of scanning electron microscopy, including imaging using different signals and X-ray spectroscopy.
Have acquired basic practical experience of transmission electron microscopy, including imaging, diffraction and X-ray and electron energy loss spectroscopy.
Have obtained basic insights into some novel methods and front line research in optical, scanning probe and electron microscopy.
Hands-on-laboratory sessions in:
1) optical microscopy,
2) atomic force microscopy (AFM),
3) scanning electron microscopy (SEM),
4) transmission electron microscopy (TEM).
Aproximate content of the 14 lectures:
1) Introduction, history and overview
2) Basic image formation and construction of an optical microscope
3) Contrast mechanisms in optical microscopy: absorption, scattering, refraction, reflection, fluorescence
4) Fluorescence microscopy techniques: scanning confocal microscopy, FRET (fluorescence resonance energy transfer), FLIM (fluorescence life-time imaging), FCS (fluorescence correlation spectroscopy).
5) Novel and/or specialized techniques, which may include SNOM (scanning near-field optical microscopy), STED (stimulated emission depletion) microscopy, laser tweezers, Raman microscopy,
6) Continued discussion about optical microscopy.
7) Image formation of scanning tunneling microscopy (STM)
8) Image formation of atomic force microscopy (AFM)
9) Image formation, contrast mechanism and novel techniques of scanning electron microscopy (SEM)
10) X-ray spectroscopy in the SEM
11) Image formation and novel techniques of transmission electron microscopy (TEM)
12) Image formation, principles, contrast mechanisms and novel techniques of scanning TEM (STEM)
13) Principles of electron diffraction in the TEM
14) X-ray and electron energy loss spectroscopy (EELS) in the TEM
The course consists of lectures and practical laboratory sessions on microscopes. The practical sessions are compulsory. Each lecture is combined with a volontary home assignment. Resonably correct solutions that are submitted not later than the deadline give bonus points on the written examination.
Scientific articles, print outs of ppt-presentations, lab manuals, web resources.
Passed the four compulsory lab sessions. There is a written exam at the end of the course.